A dynamic sampling methodology for plasma etch processes using Gaussian process regression

Jian Wan; Bahman Honari; Sean McLoone

doi:10.1109/ICAT.2013.6684080

Previous
Next
Table of Contents
Related Articles

2013 XXIV International Conference on Information, Communication and Automation Technologies (ICAT)

A dynamic sampling methodology for plasma etch processes using Gaussian process regression

Year: 2013, Pages: 1-6

DOI Bookmark: 10.1109/ICAT.2013.6684080

Authors

Jian Wan, Dept. of Electron. Eng., Nat. Univ. of Ireland, Maynooth, Ireland
Bahman Honari, Dept. of Electron. Eng., Nat. Univ. of Ireland, Maynooth, Ireland
Sean McLoone, Dept. of Electron. Eng., Nat. Univ. of Ireland, Maynooth, Ireland

A dynamic sampling methodology for plasma etch processes using Gaussian process regression

Authors

Abstract